Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Reexamination Certificate
2005-04-05
2005-04-05
Stinson, Frankie L. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
C134S103100, C134S108000, C134S902000
Reexamination Certificate
active
06874513
ABSTRACT:
A high-pressure processing apparatus for removing unnecessary matters on objects to be processed by bringing a high-pressure fluid and a chemical liquid other than the high-pressure fluid into contact with the objects to be processed in a pressurized state is provided with a plurality of high-pressure processing chambers, a common high-pressure fluid supply unit for supplying the high-pressure fluid to each one of the high-pressure processing chambers, a common chemical liquid supply unit for supplying the chemical liquid to the each high-pressure processing chambers, and a separating unit for separating gaseous components from a mixture of the high-pressure fluid and the chemical liquid discharged from the high-pressure processing chambers after the objects are processed.Thus, a high-pressure processing apparatus which has such a compact construction as to be partly installable in a clean room and can stably perform a high-pressure processing can be provided.
REFERENCES:
patent: 5344493 (1994-09-01), Jackson
patent: 5377705 (1995-01-01), Smith et al.
patent: 5772783 (1998-06-01), Stucker
patent: 6085762 (2000-07-01), Barton
patent: 6088863 (2000-07-01), McClain et al.
patent: 6248136 (2001-06-01), McClain et al.
patent: 6334340 (2002-01-01), Kegler et al.
patent: 6355072 (2002-03-01), Racette et al.
patent: 6360392 (2002-03-01), Malchow
patent: 6397421 (2002-06-01), Brainard et al.
patent: 6446644 (2002-09-01), Dolechek
patent: 6453924 (2002-09-01), Wang et al.
patent: 6477440 (2002-11-01), Davis
patent: 6558475 (2003-05-01), Jun et al.
patent: 6558622 (2003-05-01), Malchesky
patent: 6602349 (2003-08-01), Chandra et al.
patent: 6612317 (2003-09-01), Costantini et al.
patent: 20030205510 (2003-11-01), Jackson
patent: 20040025908 (2004-02-01), Douglas
patent: 5-226311 (1993-09-01), None
Inoue Yoichi
Kitakado Ryuji
Mizobata Ikuo
Muraoka Yusuke
Oshiba Hisanori
Dainippon Screen Mfg. Co,. Ltd.
Kabushiki Kaisha Kobe Seiko Sho
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Stinson Frankie L.
LandOfFree
High pressure processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High pressure processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High pressure processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3397428