High pressure parallel reactor

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Bench scale

Reexamination Certificate

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Details

C422S091000, C422S105000, C422S129000

Reexamination Certificate

active

07018589

ABSTRACT:
An apparatus for use in parallel reaction of materials includes a base having a plurality of reaction wells, each of the reaction wells having a closed lower end and open upper end for receiving reactant materials. A cover is configured for sealing engagement with the base to form a housing enclosing the plurality of reaction wells and defining a common pressure chamber in communication with the reaction wells. The apparatus further includes an inlet port in communication with the pressure chamber for supplying pressurized fluid to the chamber to pressurize the reaction wells. The housing is configured to sustain a pressure substantially above atmospheric pressure.

REFERENCES:
patent: 3617033 (1971-11-01), Ichikawa et al.
patent: 3881872 (1975-05-01), Naono
patent: 4000492 (1976-12-01), Willens
patent: 4180943 (1980-01-01), Smith et al.
patent: 4493815 (1985-01-01), Fernwood et al.
patent: 4895706 (1990-01-01), Root et al.
patent: 4927604 (1990-05-01), Mathus et al.
patent: 4990076 (1991-02-01), Lynch et al.
patent: 5011779 (1991-04-01), Maimon
patent: 5035866 (1991-07-01), Wannlund
patent: 5183564 (1993-02-01), Hong
patent: 5190666 (1993-03-01), Bisconte
patent: 5190734 (1993-03-01), Frushour
patent: 5205845 (1993-04-01), Sacks et al.
patent: 5246665 (1993-09-01), Tyranski et al.
patent: 5324483 (1994-06-01), Cody et al.
patent: 5428118 (1995-06-01), Painter et al.
patent: 5443791 (1995-08-01), Cathcart et al.
patent: 5516490 (1996-05-01), Sanadi
patent: 5529756 (1996-06-01), Brennan
patent: 5544683 (1996-08-01), Guhl
patent: 5593642 (1997-01-01), DeWitt et al.
patent: 5624815 (1997-04-01), Grant et al.
patent: 5716584 (1998-02-01), Baker et al.
patent: 5746982 (1998-05-01), Saneii et al.
patent: 5766556 (1998-06-01), DeWitt et al.
patent: 5792430 (1998-08-01), Hamper
patent: 5846396 (1998-12-01), Zanzucchi et al.
patent: 5897842 (1999-04-01), Dunn et al.
patent: 6027694 (2000-02-01), Boulton et al.
patent: 6042789 (2000-03-01), Antonenko et al.
patent: 6045755 (2000-04-01), Lebl et al.
patent: 6063633 (2000-05-01), Willson, III
patent: 6171555 (2001-01-01), Cargill et al.
patent: 6190619 (2001-02-01), Kilcoin et al.
patent: 6250707 (2001-06-01), Dintner et al.
patent: 6264891 (2001-07-01), Heynaker et al.
patent: 6309608 (2001-10-01), Zhou et al.
patent: 6376256 (2002-04-01), Dunnington et al.
patent: 6410332 (2002-06-01), Desrosiers et al.
patent: 6485692 (2002-11-01), Freitag et al.
patent: 6537500 (2003-03-01), Brenner et al.
patent: WO 97/32208 (1997-09-01), None
patent: 97/45443 (1997-12-01), None
patent: WO98/15813 (1998-04-01), None
patent: WO98/36826 (1998-08-01), None
patent: 00/03805 (2000-01-01), None
patent: 01/14529 (2000-03-01), None
patent: 01/00315 (2001-01-01), None
patent: 01/05497 (2001-01-01), None
patent: WO 01/00315 (2001-01-01), None
Grunwald et al. “Investigation of Coolant Mixing in Pressurized Water Reactors at the Rossendorf Mixing Test Facility Rocom.”.
Heiszwolf, Johan J. “Runaway in Stirred Tanks.” http://www.dct.tudelft.nl/monoliet/heiszwolf/runaway.html.
http://www.louisville.edu/speed/Mixing—Lab.htm.
http://www.epa.gov/ORD/NRMRL/Pubs/2001/water/600r01021c2.pdf/.
http://www.onlineconversion.com/.
Product Brochure for Radleys Titan Specialist Micro Titer Plates, 8 pages.
Christian Hoffmann, Anne Wolf and Ferdi Schuth, “Parallel Synthesis and Testing of Catalysts under Nearly Conventional Testing Conditions” Angew. Chem. Int. Ed 1999, 38, No. 18.

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