High pressure, improved efficiency cryogenic rectification syste

Refrigeration – Cryogenic treatment of gas or gas mixture – Separation of gas mixture

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62654, F25J 300

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058392963

ABSTRACT:
An improved efficiency system for producing low purity oxygen by rectification of air employs a high pressure column and a low pressure column and includes the steps of: turboexpanding a flow of nitrogen-rich gas from the high pressure column to provide a cooled nitrogen-rich gas flow; condensing the cooled nitrogen-rich gas flow to a nitrogen-rich liquid against a flow of a vaporizing oxygen-rich liquid flow taken from the low pressure column; passing the nitrogen-rich liquid as a reflux flow to the low pressure column; returning the vaporizing oxygen liquid to the low pressure column; and employing energy derived from the turboexpanding step to compress feed air.

REFERENCES:
patent: 4072023 (1978-02-01), Springmann
patent: 4133662 (1979-01-01), Wagner
patent: 4224045 (1980-09-01), Olszewski et al.
patent: 4464188 (1984-08-01), Agrawal et al.
patent: 4707994 (1987-11-01), Shenoy et al.
patent: 4947649 (1990-08-01), Agrawal et al.
patent: 5341547 (1994-08-01), Koeberle et al.
patent: 5341646 (1994-08-01), Agrawal et al.
patent: 5392609 (1995-02-01), Girault et al.
patent: 5611219 (1997-03-01), Bonaquist

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