Cleaning and liquid contact with solids – Processes – Including use of vacuum – suction – or inert atmosphere
Patent
1998-11-16
2000-07-18
Gulakowski, Randy
Cleaning and liquid contact with solids
Processes
Including use of vacuum, suction, or inert atmosphere
134 18, 134 221, 134 2218, 134 31, 134 42, B08B 500
Patent
active
060902221
ABSTRACT:
A high pressure gas cleaning purge cleans silicon oxide dust deposits from inside a dry vacuum pump while installed on a crystal grower. The high pressure gas cleaning purge is performed before or after each crystal is grown. The high pressure gas flow is injected into the inlet of the dry vacuum pump and repeatedly turned on and off to create differing turbulent flow patterns within the pump. The differing turbulent flow patterns effectively remove substantial quantities of the silicon oxide dust deposited in the pump during crystal growing.
REFERENCES:
patent: 4734018 (1988-03-01), Taniyame et al.
patent: 5057658 (1991-10-01), Cano et al.
"Vacuum Pumps Are Running Dry," Chemical Engineering (Jun. 1992) pp. 121, 123-126, 129, 131, 132.
Woodrow D. Farrow "Dry Vacuum Pumps Used In CVD Nitride Applications," Solid State Technology (Nov. 1993), pp. 69, 70, 72.
Kim Stroup "Quest For Improving LPCVD Vacuum Pump Operation," Semiconductor International (Aug. 1993), pp. 74-76.
A.P. Troup "Dry Pumps Operating Under Harsh Conditions In the Semiconductor Industry," J. Vac. Sci. Technol. A, vol. 7, No. 3 (May/Jun. 1989), pp. 2381-2386.
A.P. Troup et al., "Six Years of "Dry Pumping": A Review of Experience and Issues," J. Vac Sci. Technol. A 9 (3), (May/Jun. 1991), pp. 2048-2052.
John Baliga, "Vacuum Pump Designs Adjust To Harsher Conditions," Semiconductore International (Oct. 97), pp. 86-88, 90.
"Particles and Contamination In Dry Pumps", European Semiconductor (May 1990), pp. 16 & 17.
R Bahnen et al. "Increased Reliability Of Dry Pumps Due To Process Related Adaptation And Prefailure Warning," Vacuum vol. 44 Nos. 5-7, (1993), pp. 709-712.
"Taking The Pressure Off Enviromental Pollution," Processing, (Nov. 1993), pp. 20 & 21.
H.P. Berges et al. "Handling Of Particles In Forevacuum Pumps," Vacuum, vol. 41, Nos. 7-9, (1990) pp. 1828-1832.
Ivey Kenneth C.
LaBrie Aaron L.
Carrillo S.
Gulakowski Randy
SEH-America, Inc.
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