Fluid handling – Processes
Patent
1998-06-26
2000-02-22
Lee, Kevin
Fluid handling
Processes
251331, 251284, 251 64, F16K 31126
Patent
active
060268360
ABSTRACT:
A diaphragm valve including structure which incorporates a support surface positioned to limit extension away from a main valve seat of a valve seat closure diaphragm. Alternative embodiments have the support surface formed on an insert within the valve housing, and formed as part of the interior surface of a wall of the housing. Alternatives for conveying control pressure to the side of the seat closure diaphragm adjacent the support surface include forming the surface on a body of porous material, and forming the surface with a channel which communicates with a relief port. Inclusion of a support surface minimizes stress and strain in the closure diaphragm when the valve is in an open state, thereby increasing the allowable valve working pressure.
REFERENCES:
patent: 3511472 (1970-05-01), Zimmerman
patent: 3556465 (1971-01-01), Little
patent: 4014514 (1977-03-01), Priese et al.
patent: 4171792 (1979-10-01), Bass
patent: 4475711 (1984-10-01), Rountry
patent: 5104090 (1992-04-01), Grizzle et al.
patent: 5335691 (1994-08-01), Kolenc
patent: 5383646 (1995-01-01), Weingarten
patent: 5722638 (1998-03-01), Miller et al.
Honeywell Brochure Form No. 60-2080-8 (Rev. 9-94); entitled "V48A,F,J; V88A,J Diaphragm Gas Valves".
Honeywell Brochure Form No. 65-0212-1 (Rev. 10-97); entitled "V4943A/V8943A On/Off Diaphragm Gas Valves".
Honeywell Brochure Form NO. 65-0214-1 (Rev. 10-97); entitled V4943/V8943B,C,N; V4944/V8944B,C,L,N Regulating Diaphragm Gas Valves.
Honeywell Inc.
Lee Kevin
Rubow Charles L.
LandOfFree
High pressure diaphragm valve does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High pressure diaphragm valve, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High pressure diaphragm valve will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-513058