High pressure chemical vapor trapping method

Details High pressure chemical vapor trapping method High pressure chemical vapor trapping method

2005-12-27

2008-09-16

Hopkins, Robert A (Department: 1797)

Gas separation

With separating media bypass or system gas pressure relief

With heating or cooling means

C055S385200, C055SDIG015, C118S715000, C062S055500

Reexamination Certificate

active

07425224

ABSTRACT:
A high pressure trapping system is provided to collect chemical vapor by-products in successive stages through chemical reasons conducted at progressively colder temperatures. A hot trap receives chemical vapor exhaust and collects a first waste, typically a solid, as a result of the high temperature completing a chemical reason in the vapor. Surviving gaseous by-products continue to the next process. The following chamber is colder, and collects waste as a solid or a liquid as a result of a chemical process dependent on the cold temperature. Sometimes a third chamber is used for even a colder chemical reaction to collect waste products. As a solid, these waste products are easier to collect, remove, and even reuse.

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Zorich. B., et al., “Safety and Environmental Concerns of CVD Copper Precursors”, Solid State Technology, Sep. 1998, vol. 41, Issue 9, pages.

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