High precision pattern registration and overlay measurement syst

Details High precision pattern registration and overlay measurement syst High precision pattern registration and overlay measurement syst

1977-12-30

1979-10-30

Clark, Conrad J.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356400, G02B 900

Patent

active

041726642

ABSTRACT:
A system for measuring the lateral displacement between edges located on two spaced apart objects, with a precision in the order of 1 microinch, generates and analyses the diffraction pattern produced by the physical edge on one object and the aerial image of the edge on the other object. The system can be used for the alignment of the objects or the comparison of patterns located on the objects.

REFERENCES:
patent: 3565532 (1971-02-01), Heitmann
patent: 3751170 (1973-08-01), Hidaka
patent: 3796497 (1974-03-01), Mathisen
patent: 3797939 (1974-03-01), Pryor
patent: 3883249 (1975-05-01), Pryor
patent: 3957376 (1976-05-01), Charsky
Barshay, M. et al., "Width and Overlay Measuring Algorithm", IBM Tech. Disclosure Bulletin, vol. 19, No. 11, Apr. 1977, p. 4203.

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