High power phase masks for imaging systems

Details High power phase masks for imaging systems High power phase masks for imaging systems

1994-04-20

1996-01-09

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 2, 430322, 430323, G03F 900

Patent

active

054828015

ABSTRACT:
The phase mask comprises binary square wave gratings which deflect light away from the collecting aperture of the projection system and binary phase gratings which deflect the incident light into a fan of rays to fill the collecting aperture. In the transmissive regions, the mask consists of randomly-placed squares etched to a depth corresponding to a half wave retardation and filling approximately fifty percent of the area within the transmissive region. The "blocking" regions consist of a binary grating etched to the same depth as that of the transmissive region but having sufficiently high spatial frequency to deflect the incident light to points outside of the collecting aperture.

REFERENCES:
patent: 4902899 (1990-02-01), Lin
patent: 4923772 (1990-05-01), Kirch
Lee, Wai-Hon, (1974) "Binary Synthetic Holograms", Applied Optics 13:1677-1682.
Liu, Y. S., et al. (1990) "A Novel Excimer Beam Delivery Technique Using Binary Masks", SPIE 1377:126-133.
Rastani, Kasra, et al. (1991) "Binary phase Fresnel lenses for generation of two-dimensional beam arrays", Applied Optics, 30:1347-1354.
Toh, Kenny K. H., et al. (1991) "Optical Lithography with Chromeless Phase-Shifted Masks", SPIE 1463:74-86.

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