High-power ion sputtering magnetron

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

Reexamination Certificate

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C204S298210

Reexamination Certificate

active

06841051

ABSTRACT:
A high-power ion sputtering magnetron having a rotary cathode comprising a conducting member disposed within the rotary cathode being made of an electrically conductive material for conducting electrical current from the power supply to the rotary cathode. The ion sputtering magnetron also has an electromagnetic field shield disposed between the conducting member and the drive shaft portion. The field shield is made of an electromagnetic field-permeable material such as a ferrous material for reducing damage to parts adjacent to the conducting member that are susceptible to inductive magnetic heating.

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patent: 4824540 (1989-04-01), Stuart
patent: 5096562 (1992-03-01), Boozenny et al.
patent: 5100527 (1992-03-01), Stevenson et al.
patent: 5200049 (1993-04-01), Stevenson et al.
patent: 5814195 (1998-09-01), Lehan et al.

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