Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor
Reexamination Certificate
2007-01-09
2007-01-09
Prenty, Mark V. (Department: 2822)
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Field effect transistor
C257S488000
Reexamination Certificate
active
11005107
ABSTRACT:
Field effect transistors having a power density of greater than 25 W/mm when operated at a frequency of at least 4 GHz are provided. The power density may be at least 30 W/mm when operated at 4 GHz. The power density of at least 30 W/mm may be provided at a drain voltage of 120 V. Transistors with a power density of at least 30 W/mm when operated at 8 GHz are also provided. The power density of at least 30 W/mm may be provided at a drain voltage of 120 V. Field effect transistors having a power density of greater than 20 W/mm when operated at a frequency of at least 10 GHz are also provided. Field effect transistors having a power density of at least 2.5 W/mm and a two tone linearity of at least −30 dBc of third order intermodulation distortion at a center frequency of at least 4 GHz and a power added efficiency (PAE) of at least 40% are also provided.
REFERENCES:
patent: 4424525 (1984-01-01), Mimura
patent: 4471366 (1984-09-01), Delagebeaudeuf et al.
patent: 4727403 (1988-02-01), Hilda et al.
patent: 4755867 (1988-07-01), Cheng
patent: 4788156 (1988-11-01), Stoneham et al.
patent: 4946547 (1990-08-01), Palmour et al.
patent: 5053348 (1991-10-01), Mishra et al.
patent: 5172197 (1992-12-01), Nguyen et al.
patent: 5192987 (1993-03-01), Khan et al.
patent: 5200022 (1993-04-01), Kong et al.
patent: 5210051 (1993-05-01), Carter, Jr.
patent: 5296395 (1994-03-01), Khan et al.
patent: 5298445 (1994-03-01), Asano
patent: RE34861 (1995-02-01), Davis et al.
patent: 5389571 (1995-02-01), Takeuchi et al.
patent: 5393993 (1995-02-01), Edmond et al.
patent: 5523589 (1996-06-01), Edmond et al.
patent: 5534462 (1996-07-01), Fiordalice et al.
patent: 5592501 (1997-01-01), Edmond et al.
patent: 5686737 (1997-11-01), Allen
patent: 5700714 (1997-12-01), Ogilhara et al.
patent: 5701019 (1997-12-01), Matsumoto et al.
patent: 5705827 (1998-01-01), Baba et al.
patent: 5804482 (1998-09-01), Konstantinov et al.
patent: 5885860 (1999-03-01), Weitzel et al.
patent: 5946547 (1999-08-01), Kim et al.
patent: 5990531 (1999-11-01), Taskar et al.
patent: 6028328 (2000-02-01), Riechert et al.
patent: 6046464 (2000-04-01), Schetzina
patent: 6051849 (2000-04-01), Davis et al.
patent: 6064082 (2000-05-01), Kawai et al.
patent: 6086673 (2000-07-01), Molnar
patent: 6150680 (2000-11-01), Eastman et al.
patent: 6177685 (2001-01-01), Teraguchi et al.
patent: 6177688 (2001-01-01), Linthicum et al.
patent: 6218680 (2001-04-01), Carter, Jr. et al.
patent: 6255198 (2001-07-01), Linthicum et al.
patent: 6261929 (2001-07-01), Gehrke et al.
patent: 6316793 (2001-11-01), Sheppard et al.
patent: 6376339 (2002-04-01), Linthicum et al.
patent: 6380108 (2002-04-01), Linthicum et al.
patent: 6429467 (2002-08-01), Ando
patent: 6448648 (2002-09-01), Boos
patent: 6462355 (2002-10-01), Linthicum et al.
patent: 6486042 (2002-11-01), Gehrke et al.
patent: 6489221 (2002-12-01), Gehrke et al.
patent: 6492669 (2002-12-01), Nakayama et al.
patent: 6515316 (2003-02-01), Wojtowicz et al.
patent: 6521514 (2003-02-01), Gehrke et al.
patent: 6545300 (2003-04-01), Gehrke et al.
patent: 6548333 (2003-04-01), Smith
patent: 6570192 (2003-05-01), Davis et al.
patent: 6582906 (2003-06-01), Cao et al.
patent: 6582986 (2003-06-01), Kong et al.
patent: 6586778 (2003-07-01), Linthicum et al.
patent: 6586781 (2003-07-01), Wu et al.
patent: 6602763 (2003-08-01), Davis et al.
patent: 6602764 (2003-08-01), Linthicum et al.
patent: 6608327 (2003-08-01), Davis et al.
patent: 6621148 (2003-09-01), Linthicum et al.
patent: 6639255 (2003-10-01), Inoue et al.
patent: 6686261 (2004-02-01), Gehrke et al.
patent: 6706114 (2004-03-01), Mueller
patent: 2001/0015446 (2001-08-01), Inoue et al.
patent: 2001/0020700 (2001-09-01), Inoue et al.
patent: 2001/0023964 (2001-09-01), Wu et al.
patent: 2001/0040246 (2001-11-01), Ishii
patent: 2002/0008241 (2002-01-01), Edmond et al.
patent: 2002/0017696 (2002-02-01), Nakayama et al.
patent: 2002/0066908 (2002-06-01), Smith
patent: 2002/0079508 (2002-06-01), Yoshida
patent: 2002/0119610 (2002-08-01), Nishii et al.
patent: 2002/0167023 (2002-11-01), Charvarkar et al.
patent: 2003/0017683 (2003-01-01), Emrick et al.
patent: 2003/0020092 (2003-01-01), Parikh et al.
patent: 2003/0102482 (2003-06-01), Saxler
patent: 2003/0123829 (2003-07-01), Taylor
patent: 2003/0145784 (2003-08-01), Thompson et al.
patent: 2003/0157776 (2003-08-01), Smith
patent: 2003/0213975 (2003-11-01), Hirose et al.
patent: 2004/0004223 (2004-01-01), Nagahama et al.
patent: 2004/0012015 (2004-01-01), Saxler
patent: 2004/0021152 (2004-02-01), Nguyen et al.
patent: 2004/0029330 (2004-02-01), Hussain et al.
patent: 2004/0061129 (2004-04-01), Saxler et al.
patent: 2004/0241970 (2004-12-01), Ring
patent: 2006/0118809 (2006-06-01), Parikh et al.
patent: 0 334 006 (1989-09-01), None
patent: 0 563 847 (1993-10-01), None
patent: 10-050982 (1998-02-01), None
patent: 11261053 (1999-09-01), None
patent: 2001230407 (2001-08-01), None
patent: 2002016087 (2002-01-01), None
patent: 2004-342810 (2004-12-01), None
patent: WO 93/23877 (1993-11-01), None
patent: WO 01/57929 (2001-08-01), None
patent: WO 03/049193 (2003-06-01), None
patent: WO 04/008495 (2004-01-01), None
patent: WO 05/024909 (2005-03-01), None
Ambacher et al., “Two Dimensional Electron Gases Induced by Spontaneous and Piezoelectric Polarization Charges in N- and Ga-face AlGaN/GaN Heterostructures,”Journal of Applied Physics. vol. 85, No. 6, pp. 3222-3233 (Mar. 1999).
Ando et al., “10-W/mm AlGaN-GaN HFET With a Field Modulating Plate,”IEEE Electron Device Letters, 24(5), pp. 289-291 (May 2003).
Asbeck et al. “Piezoelectric charge densities in AlGaN/GaN HFETs,”Electronics Letters. vol. 33, No. 14, pp. 1230-1231, Jul. 1997.
Beaumont, B. et al., “Epitaxial Lateral Overgrowth of GaN,”Phys. Stat. Sol. (b) 227, No. 1, pp. 1-43 (2001).
Ben-Yaacov et al., “AlGaN/GaN Current Aperture Vertical Electron Transistors with Regrown Channels,”Journal of Applied Physics. vol. 95, No. 4, pp. 2073-2078, Feb. 2004.
Breitschadel et al. “Minimization of Leakage Current of Recessed Gate AlGaN/GaN HEMTs by Optimizing the Dry-Etching Process,”Journal of Electronic Materials. vol. 28, No. 12, pp. 1420-1423 (1999).
Burm et al. “Recessed Gate GaN MODFETS,”Solid-State Electronics. vol. 41, No. 2, pp. 247-250 (1997).
Burm et al. “Ultra-Low Resistive Ohmic Contacts onn-GaNUsing Si Implantation,”Applied Physics Letters. vol. 70, No. 4, 464-66, Jan. 1997.
Chang et al., “AlGaN/GaN Modulation-Doped Field-Effect Transistors with an Mg-doped Carrier Confinement Layer,”Jpn. J. Appl. Phys., 42:3316-3319, Jun. 2003.
Chen et al. “CI2 reactive ion etching for gate recessing of AlGaN/GaN field-effect transistors,”J. Vac. Sci. Technol. B. vol. 17, No. 6, pp. 2755-2758, Nov. 1999.
Chini et al., “Power and Linearity Characteristics of Field-Plagted Recessed-Gate AlGaN-GaN HEMTs,”IEEE Electron Device Letters, 25(5), pp. 229-231 (May 2004).
Cho et al., “A New GaAs Field Effect Transistor (FET) with Dipole Barrier (DIB),”Jpn. J. Appl. Phys. 33:775-778, Jan. 1994.
Coffie et al., Unpassivated p-GaN/AlGaN/GaN HEMTs with 7.1 W/MMF at 10 GHz,Electronic Letters onlineNo. 20030872, 39(19), (Sep. 18, 2003).
Eastman et al. “GaN materials for high power microwave amplifiers,”Mat. Res. Soc. Symp. Proc. vol. 512 (1998).
Eastman et al. “Undoped AlGaN/GaN HEMTs for Microwave Power Amplification,”IEEE Transactions on Electron Devices. vol. 48, No. 3, pp. 479-485 (Mar. 2001).
Egawa et al. “Recessed gate ALGaN/GaN MODFET on Sapphire Grown by MOCVD,”Applied Physics Letters. vol. 76, No. 1, pp. 121-123 (Jan. 2000).
Gaska et al. “Electron Transport in AlGaN/GaN Heterostructures Grown on 6H-SiC Substrates,”Applied Physics Letters. vol. 72, No. 6, pp. 707-709 (Feb. 1998).
Gaska et al. “High-Temperature Performance of AlGaN/GaN HFET's on SiC Substrates,”IEEE Electron Device Letters. vol. 18, No. 1, pp. 492-494 (Oct. 1997).
Gaska et al., “Self-H
Parikh Primit
Saxler Adam William
Wu Yifeng
Cree Inc.
Myers Bigel & Sibley & Sajovec
Prenty Mark V.
LandOfFree
High power density and/or linearity transistors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High power density and/or linearity transistors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High power density and/or linearity transistors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3815816