Chemistry of inorganic compounds – Phosphorus or compound thereof – Oxygen containing
Patent
1989-06-07
1991-07-09
Garvin, Patrick P.
Chemistry of inorganic compounds
Phosphorus or compound thereof
Oxygen containing
502208, B01J 2718
Patent
active
050304313
ABSTRACT:
Aluminum phosphate compositions are provided which are characterized simultaneously by high porosity and phosphorous-to-aluminum ratios of approximately 1.0. The high porosity of these compositions is a function of high pore volume coupled with low surface area, resulting in high average pore diameter. These materials have excellent properties as catalysts and catalyst supports.
REFERENCES:
patent: 3342750 (1967-09-01), Kearby
patent: 3904550 (1975-09-01), Pine
patent: 4080311 (1978-02-01), Kehl
patent: 4210560 (1980-07-01), Kehl
patent: 4219444 (1980-08-01), Hill et al.
patent: 4289863 (1981-09-01), Hill et al.
patent: 4364842 (1982-12-01), McDaniel et al.
patent: 4364854 (1982-12-01), McDaniel et al.
patent: 4364855 (1982-12-01), McDaniel et al.
patent: 4385994 (1983-05-01), Wilson et al.
patent: 4397765 (1983-08-01), McDaniel et al.
patent: 4444962 (1984-04-01), McDaniel et al.
patent: 4444964 (1984-04-01), McDaniel et al.
patent: 4444965 (1984-04-01), McDaniel et al.
patent: 4547479 (1985-10-01), Johnson et al.
patent: 4769429 (1988-09-01), Furtek
Kearby-Int. Cong. Cat.-2567-79; 1960.
Moffat-Cat. Rev.-Sci. Eng.-18/199-258; 1978.
Marcelin et al.-J. of Cat.-83/42-49; 1983.
Grebenki et al., "Synthesis and Study of Porous Aluminophosphates"; Inorg. Chem (86:507); 1977.
Fourson George R.
Garvin Patrick P.
Krafte Jill H.
W. R. Grace & Co.,-Conn.
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