High-performance punchthrough implant method for MOS/VLSI

Details High-performance punchthrough implant method for MOS/VLSI High-performance punchthrough implant method for MOS/VLSI

1993-09-24

1995-08-22

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437229, 148DIG137, H01L 21266

Patent

active

054440084

ABSTRACT:
A method of making high performance MOSFETs uses image reversal lithography to make punchthrough implants.

REFERENCES:
patent: 4564584 (1986-01-01), Fredericks et al.
patent: 4895520 (1990-01-01), Berg

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