High performance integrated vertical transistors and method...

Semiconductor device manufacturing: process – Forming bipolar transistor by formation or alteration of... – Complementary bipolar transistors

Reexamination Certificate

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C438S340000

Reexamination Certificate

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10905685

ABSTRACT:
A complementary bipolar transistor is fabricated using an available portion of a silicon germanium (SiGe) low temperature epitaxial layer as the raised base region for a vertical NPN transistor, and another portion of the same SiGe LTE layer as a vertical PNP collector layer. The complementary pair of transistors is vertically aligned and operates in a single direction.

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patent: 2003/0183903 (2003-10-01), Ikeda
patent: 2003/0219952 (2003-11-01), Fujimaki

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