High-performance electrodeposited chromium layers formed at high

Details High-performance electrodeposited chromium layers formed at high High-performance electrodeposited chromium layers formed at high

1989-09-14

1990-05-22

Kaplan, G. L.

Chemistry: electrical and wave energy

Processes and products

204 431, C25D 304

Patent

active

049275062

ABSTRACT:
Novel chromium plating baths suitable for electrodepositing chromium layers which are bright, adherent, smooth and hard, and are capable of being formed at both high and low current densities, and at high cathodic current efficiencies, consist essentially of chromic acid and sulfoacetic acid in a concentration range of about 40 to 150 g/l., and selenate or tellurate ion. Sulfate ion, if present, is included in low concentrations such that the Cr/SO.sub.4 ratio is high, preferably 300:1 or more.

REFERENCES:
patent: 3758390 (1973-09-01), Chessin et al.
patent: 3804728 (1974-04-01), Chessin et al.
patent: 4472249 (1984-09-01), Chessin
patent: 4828656 (1989-05-01), Korbach et al.
patent: 4836897 (1989-06-01), Korbach et al.

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