Patent
1980-12-19
1983-04-19
Edlow, Martin H.
357 16, 357 58, 357 91, H01L 29161, H01L 2972, H01L 2912
Patent
active
043807747
ABSTRACT:
A high-frequency transistor and method of making same wherein the parasitic apacitance between base and collector is reduced. The collector layer of GaAs is impregnated with boron ions to form an insulative region under the base contact structure thereby reducing the capacitance in this region and leaving only the region underlying the emitter structure as the active transistor region.
REFERENCES:
patent: 3622842 (1971-11-01), Oberai
patent: 3653978 (1972-04-01), Robinson et al.
patent: 4007474 (1977-02-01), Yagi et al.
patent: 4151006 (1979-04-01), DeGraaff et al.
patent: 4173763 (1979-11-01), Chang et al.
patent: 4286275 (1981-08-01), Heiblum
Beers R. F.
Carroll J.
Edlow Martin H.
Schneider P.
The United States of America as represented by the Secretary of
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