High penetration deposition process and apparatus

Details High penetration deposition process and apparatus High penetration deposition process and apparatus

1989-12-06

1990-07-24

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118 501, C23C 1424

Patent

active

049428446

ABSTRACT:
A method and apparatus for deep penetration deposition of material in a porous substrate utilizes a pressure differential across the substrate to effect penetration of arc-produced vapor from one chamber through the body. The one chamber can be held at a pressure of 10.sup.-2 to 10.sup.-3 torr while the other chamber is at a pressure of 10.sup.-5 to 10.sup.-6 torr.

Affiliated with

Also associated with

Rating

High penetration deposition process and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High penetration deposition process and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High penetration deposition process and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1262838