Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate
Patent
1995-01-17
1995-12-05
Seidleck, James J.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From phenol, phenol ether, or inorganic phenolate
528155, 528156, 528165, C08G 804, C08G 1404
Patent
active
054730457
ABSTRACT:
A phenolic novolak composition prepared by a process comprising the steps of:
(1) reacting a first phenolic monomer comprising a major portion of at least one trifunctional phenolic monomer with a first aldehyde source in the absence of a catalyst at a reaction temperature from about 100.degree. C. to about 200.degree. C. and at a reaction pressure of about 2 to about 15 atmospheres to form a phenolic oligomer having a weight average molecular weight from about 500 to about 2,000, having ortho--ortho bonding of about 55% to about 75% of the methylene bonds between the phenolic moieties; and having a time to clear of less than 125 seconds per micron; wherein the mole ratio of said first aldehyde source to said first phenolic monomer is from about 0.3:1.0 to about 0.55:1.0; and
(2) then reacting said oligomer with an optional second phenolic source and a second aldehyde source at a temperature from about 80.degree. C. to about 150.degree. C. to form a phenolic novolak having a weight average molecular weight of 3,000 to 40,000, having ortho--ortho bonding of between 50% and 70% of the methylene bonds between the phenolic moieties, and having a time to clear of at least 20 seconds per micron; wherein the mole ratio of said second aldehyde source to said total phenolic moieties is less than about 0.8:1.0.
REFERENCES:
patent: 4377631 (1983-03-01), Toukhy
patent: 4529682 (1985-07-01), Toukhy
patent: 4555469 (1985-11-01), Erdmann et al.
patent: 4587196 (1986-05-01), Toukhy
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 4959293 (1990-09-01), Blakeney et al.
patent: 4970287 (1990-11-01), Blakeney et al.
patent: 5001040 (1991-03-01), Blakeney et al.
patent: 5024921 (1991-06-01), Blakeney et al.
patent: 5053479 (1991-10-01), Blakeney et al.
patent: 5145763 (1992-09-01), Bassett et al.
patent: 5196289 (1993-03-01), Jeffries, III et al.
patent: 5235022 (1993-08-01), Jeffries, III et al.
patent: 5238776 (1993-08-01), Zampini
Templeton et al. "On the Dissolution Kinetics of Positive Photoresists--The Secondary Structure Model", SPIE vol. 771, Advances in Resist Technology & Processing IV, Dec. 1987) pp. 136-147.
Hanabata et al. "High Resolution Positive Photoresists", SPIE vol. 631, Advances in Resist Technology and Processing III, Dec. 1986).
Sarubbi Thomas R.
Sizensky Joseph J.
Toukhy Medhat A.
Cooney Jr. John M.
OCG Microelectronic Materials Inc.
Seidleck James J.
Simons William A.
LandOfFree
High ortho-ortho bonded novolak binder resins and their use in r does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High ortho-ortho bonded novolak binder resins and their use in r, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High ortho-ortho bonded novolak binder resins and their use in r will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1374910