Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...
Reexamination Certificate
2007-05-29
2007-05-29
McClendon, Sanza L. (Department: 1711)
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
Compositions to be polymerized by wave energy wherein said...
C522S172000, C522S081000, C438S478000, C438S482000, C438S488000, C438S489000, C524S861000
Reexamination Certificate
active
10420521
ABSTRACT:
It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.
REFERENCES:
patent: 6514801 (2003-02-01), Yudasaka et al.
patent: 6518087 (2003-02-01), Furusawa et al.
patent: 6541354 (2003-04-01), Shimoda et al.
patent: 6864133 (2005-03-01), Aoki et al.
patent: 6884700 (2005-04-01), Aoki et al.
patent: 2003/0045632 (2003-03-01), Shiho et al.
patent: 2003/0234398 (2003-12-01), Aoki et al.
patent: 2004/0029364 (2004-02-01), Aoki et al.
patent: 0 152 704 (1985-08-01), None
patent: 1 085 560 (2001-03-01), None
patent: 1 113 502 (2001-07-01), None
patent: 1 284 306 (2003-02-01), None
patent: 2077 710 (1981-12-01), None
patent: 57-27915 (1982-02-01), None
patent: 60-188429 (1985-09-01), None
patent: 64-029661 (1989-01-01), None
patent: 5-144741 (1993-06-01), None
patent: 06-191821 (1994-07-01), None
patent: 7-267621 (1995-10-01), None
patent: 10-321536 (1998-12-01), None
patent: 11-260729 (1999-09-01), None
patent: 2000-007317 (2000-01-01), None
patent: 2000-031066 (2000-01-01), None
patent: 2001-262058 (2001-09-01), None
patent: 2001-308020 (2001-11-01), None
patent: 2001-348219 (2001-12-01), None
patent: 2003-055556 (2003-02-01), None
patent: 2003-124486 (2003-04-01), None
patent: 2003-171556 (2003-06-01), None
patent: 2003-316279 (2003-11-01), None
patent: 2003-318119 (2003-11-01), None
patent: 2003-318120 (2003-11-01), None
patent: 2003-318191 (2003-11-01), None
patent: 2003-318193 (2003-11-01), None
patent: WO00/58409 (2000-10-01), None
patent: WO00/59040 (2000-10-01), None
patent: WO0059015 (2000-10-01), None
patent: WO0059044 (2000-10-01), None
European Search Report, EP Application No. 03252524.8.
Communication from Korean Patent Office regarding related application.
Communication from Japanese Patent Office (with translation) regarding related application.
Aoki Takashi
Furusawa Masahiro
Iwasawa Haruo
Kateuchi Yasumasa
Matsuki Yasuo
Harness & Dickey & Pierce P.L.C.
JSR Corporation
McClendon Sanza L.
Seiko Epson Corporation
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