Optical: systems and elements – Mirror – Plural mirrors or reflecting surfaces
Patent
1999-03-15
2000-03-07
Spyrou, Cassandra
Optical: systems and elements
Mirror
Plural mirrors or reflecting surfaces
359856, 359861, 359862, 359858, 359859, 359713, 359730, 359731, 378 34, G02B 508
Patent
active
060330791
ABSTRACT:
An all-refelctive optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six refelecting surfaces has an aspheric departure of less than 16.0 .mu.m.
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Grzybicki Daryl
Sikd-er Mohammad Y.
Spyrou Cassandra
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