Optical: systems and elements – Lens – With reflecting element
Reexamination Certificate
2008-01-08
2008-01-08
Pritchett, Joshua L. (Department: 2872)
Optical: systems and elements
Lens
With reflecting element
C359S726000, C359S730000, C359S857000, C359S858000, C359S860000
Reexamination Certificate
active
10224485
ABSTRACT:
The present invention relates to a high numerical aperture exposure system having a wafer. The exposure system in the present invention includes a beam-splitter, a reticle, a reticle optical group, where the reticle optical group is placed between the reticle and the beam-splitter, a concave mirror, a concave mirror optical group, where the concave mirror optical group is placed between the concave mirror and the beam-splitter, a fold mirror, where the fold mirror is placed between the beam-splitter and the wafer, and a wafer optical group, where the wafer optical group is placed between the beam-splitter and the wafer. In the present invention, a beam of light is directed through the reticle and the reticle optical group to the beam-splitter, then it is reflected by the beam-splitter onto the concave mirror. Concave mirror reflects the light onto the fold mirror through the beam-splitter. Fold mirror reflects the light onto the wafer through the wafer optical group. The present invention forms an intermediate image between the fold mirror and the wafer optical group. Furthermore, in an embodiment an aperture stop can be placed between the concave mirror optical group and the concave mirror.
REFERENCES:
patent: 4953960 (1990-09-01), Williamson
patent: 5052763 (1991-10-01), Singh et al.
patent: 5212593 (1993-05-01), Williamson et al.
patent: 5537260 (1996-07-01), Williamson
patent: 5583696 (1996-12-01), Takahashi
patent: 5636066 (1997-06-01), Takahashi
patent: 5691802 (1997-11-01), Takahashi
patent: 5694241 (1997-12-01), Ishiyama et al.
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5808805 (1998-09-01), Takahashi
patent: 5835284 (1998-11-01), Takahashi et al.
patent: 5966216 (1999-10-01), Galburt et al.
patent: 5969882 (1999-10-01), Takahashi
patent: 5999333 (1999-12-01), Takahashi
patent: 6069749 (2000-05-01), Omura
patent: 6424471 (2002-07-01), Ulrich et al.
patent: 6486940 (2002-11-01), Williamson
patent: 6624880 (2003-09-01), Sandstrom et al.
patent: 2002/0012107 (2002-01-01), Suzuki
patent: 0 608 572 (1994-08-01), None
patent: 1 102 100 (2001-05-01), None
patent: WO/01/82000 (2001-11-01), None
European Search Report issued May 25, 2005 for Appln. No. 02 018 247.3, 5 pages.
Patent Abstracts of Japan, Publication No. 2002-182112, English Language Abstract for JP Patent Application No. 2000-384709.
Nonogaki, S. et al.,Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, Marcel Dekker, Inc., ISBN 0-8247-9951-8, Entire Book (1998).
Oskotsky Mark L
Smirnov Stanislav
ASML Holding N.V.
Pritchett Joshua L.
Sterne, Kessler, Goldstein & Fox P.L.L.C
LandOfFree
High numerical aperture projection system and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High numerical aperture projection system and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High numerical aperture projection system and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3934998