Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing
Reexamination Certificate
2006-08-02
2010-02-23
Gonzalez, Porfirio Nazario (Department: 1621)
Organic compounds -- part of the class 532-570 series
Organic compounds
Heavy metal containing
C534S015000, C438S681000, C427S248100
Reexamination Certificate
active
07667065
ABSTRACT:
This invention relates to high nucleation density organometallic ruthenium compounds. This invention also relates to a process for producing a high nucleation density organometallic ruthenium compound comprising reacting a bis(substituted-pentadienyl)ruthenium compound with a substituted cyclopentadiene compound under reaction conditions sufficient to produce said high nucleation density organometallic ruthenium compound. This invention further relates to a method for producing a film, coating or powder by decomposing a high nucleation density organometallic ruthenium compound precursor, thereby producing the film, coating or powder.
REFERENCES:
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Shibutami, T., et al. “Ruthenium Film with High Nuclear Density Deposited by MOCVD Using a Novel Liquid Precursor”,Electrochemcial and Solid-State Letters, 6 (9) C117-C119 (2003).
Stahl, L. et al.. “Synthesis and Characterization of Bis(pentsdienyl) ruthenium Compounds”, Organometallics 1983, 2, 1229-1234.
Stahl, L. et al. “Synthetic, Structural and PE Spectroscopic Studies on Bis(Pentadienyl) Compounds of Iron, Ruthenium and Osmium, The Role of the Heavy Metal”,Journal of Organometallic Chemistry, 326 (1987) 257-268.
Hofer, O. et al. “Synthesis of Monosubstituted and Disubstituted Ruthenocenes” J.Organometal. Chem., vol. 13. pp. 4443-4456 (1968).
Y. Matsui, et al. “Characteristics of Ruthenium Films Prepared by Chemical Vapor Deposition Using Bis (ethylcyclopentadienyl)ruthenium Precursor”,Electrochemical and Solid-State Letters, 5 (1) C18-21 (2002).
Gonzalez Porfirio Nazario
Praxair Technology Inc.
Schwartz Iurie A.
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