High molecular mass N,O-sulphated heparosans, process for their

Details High molecular mass N,O-sulphated heparosans, process for their High molecular mass N,O-sulphated heparosans, process for their

1992-11-30

1994-05-24

Lilling, Herbert J.

Drug, bio-affecting and body treating compositions

Designated organic active ingredient containing

Carbohydrate doai

536 21, C08B 3700, C12P 1904, C12N 120, D61K 31725

Patent

active

053148762

ABSTRACT:
The subject of the invention is new high molecular mass N,O-sulphated heparosans consisting of chains or of a mixture of chains having a molecular mass of between 1.5.times.10.sup.4 and 4.0.times.10.sup.6 D, characterised by a repeating disaccharide structure of formula I: ##STR1## in which E represents, in 0 to 80% of the disaccharide units of the said N,O-sulphated heparosan, an acetyl group and, in the remaining disaccharide units, a sulphate group and optionally a hydrogen atom, G represents a hydrogen atom and a sulphate group, and the pharmaceutically acceptable salts of the said N,O-sulphated heparosans.

REFERENCES:
patent: 4818817 (1989-04-01), Shoham et al.
Abs. Biotech 92-10267 EP. 489647 (Jun. 10, 1992) Elf-Sanofi.
Risenfeld et al., "Biosynthesis of Heparin. Effect of Detergent on the Microsomal Polymerization & Polymer Modification Processes", Glycoconjugate, vol. 4, pp. 179-189, 1987.
Kusche et al., "Biosynthesis of Heparin. Use of Escherichia coli K5 capsular polysaccharide as a Model Substrate in Enzymic Polymer-Modification . . . ", Biochem. J., vol. 275, pp. 151-158, Apr. 1991.

Affiliated with

Also associated with

Rating

High molecular mass N,O-sulphated heparosans, process for their does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High molecular mass N,O-sulphated heparosans, process for their , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High molecular mass N,O-sulphated heparosans, process for their will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1972779