High-mobility amorphous silicon displaying non-dispersive transp

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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136258, 357 2, 357 30, 357 15, 427 74, 427 84, 427 86, B05D 512, H01L 3118

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045460094

ABSTRACT:
The present invention teaches a combination of parameters for the glow discharge decomposition of silane deposition of an amorphous silicon semiconductor having non-dispersive high mobility transport of majority carriers through the semiconductor material, useful in switching devices such as diodes, transistors and the like.

REFERENCES:
patent: 4064521 (1977-12-01), Carlson
patent: 4069492 (1978-01-01), Pankove et al.
A. R. Moore, "Electron And Hole Drift Mobility In Amorphous Silicon", Appl. Phys. Lett., vol. 31, pp. 762-764 (1977).
W. E. Spear et al., "Investigation Of The Localised State Distribution In Amorphons Si Films", J. Non-Crystalline Solids, vols. 8-10, pp. 727-738 W. Fuhs et al., Physica Status Solidi B. vol. 89, 495 (1978).
R. Williams et al., "Carrier Generation Recombination & Transport In Amorphous Silicon Solar Cells", RCA Review, vol. 40, pp. 371-389 (1979).
J. Jang et al., Solar Energy Materials, vol. 7, pp. 377-384 (1982).
B. W. Faughnan et al., Appl. Phys. Lett. vol. 44, pp. 537-539 (1984).
D. Allan, Philosophical Magazine B, vol. 38, pp. 381-392 (1978).

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