Electric lamp and discharge devices – With gas or vapor – Electrode composition
Reexamination Certificate
2006-03-30
2009-08-04
Patel, Nimeshkumar D. (Department: 2879)
Electric lamp and discharge devices
With gas or vapor
Electrode composition
C313S34600R
Reexamination Certificate
active
07569994
ABSTRACT:
The present high-load and high-intensity discharge lamp includes a cathode made of a material which does not (substantially) include thorium but can be used as a cathode material of high heat load, so that a long lifetime and high stability corresponding to those of thoriated-tungsten can be realized. Specifically, the cathode is made of a metal base having a high melting point which mainly consists of tungsten and includes a coexisting substance in which an oxide of at least one kind of metal selected from lanthanum, cerium, yttrium, scandium, and gadolinium and an oxide of at least one kind of metal selected from titanium, zirconium, hafnium, niobium, and tantalum are coexistent. The conversion grain size of the coexisting substance is 15 μm or greater, and the plurality of coexisting substances are present in the metal base with a high melting point.
REFERENCES:
patent: 5530317 (1996-06-01), Willemsen et al.
patent: 5627430 (1997-05-01), Kira et al.
patent: 2002/0024280 (2002-02-01), Miyamoto et al.
patent: 2005/0104521 (2005-05-01), Berndanner et al.
patent: 05-054854 (1993-03-01), None
patent: 06-060806 (1994-03-01), None
patent: 07-153421 (1995-06-01), None
patent: 08-077967 (1996-03-01), None
patent: WO03/075310 (2003-09-01), None
Bowman Mary Ellen
Patel Nimeshkumar D.
Rader & Fishman & Grauer, PLLC
Ushio Denki Kabushiki Kaisha
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