High intensity microfocus X-ray source for industrial computeriz

Details High intensity microfocus X-ray source for industrial computeriz High intensity microfocus X-ray source for industrial computeriz

1984-06-25

1986-08-19

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Source

Electron tube

378 58, 378130, H01J 3514, H01J 3526

Patent

active

046073809

ABSTRACT:
A high intensity microfocus x-ray source for the inspection of superalloy objects and the like operates at a voltage of the order of 400-500 kV with an electron beam focal spot size of the order of 2-10 mils and at power levels of tens to hundreds of kilowatts and affords a brightness improvement of at least three thousand over conventional x-ray sources.

REFERENCES:
patent: 4392238 (1983-07-01), Lersmacher et al.
patent: 4414681 (1983-11-01), Seifert
Kagawa et al., "Heavy Duty Rotating Anode X-Ray Tube with Ultra Fine Focus for Enlargement Radiography", Shimadzu Rev. (Japan), 30(2-3), 1973, pp. 155-165.
"A New High Heat Load X-Ray Tube" by Arthur H. Iverson and Stephen Whitaker (presented at the SPIE-Medicine XII, 2/26-29/84.
"Boiling Burnout with Water in Vortex Flow", W. R. Gambill & N. D. Greene, Chemical Engineering Progress, 10/58, vol. 54, No. 10, pp. 68-76.

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