Chemistry of inorganic compounds – Nitrogen or compound thereof – Binary compound
Patent
1985-10-17
1986-08-26
Doll, John
Chemistry of inorganic compounds
Nitrogen or compound thereof
Binary compound
204192C, C01B 3134, C23C 1500
Patent
active
046082433
ABSTRACT:
A high hardness hafnium nitride formed by a reactive sputter coating of a substrate in a closed chamber with a substantially pure hafnium target, and an atmosphere of argon and nitrogen. The hafnium nitride has a face centered cubic structure with a lattice spacing of 4.55 to 4.58 .ANG., and a hardness in the range of 2700 to 5500 kilograms per square millimeter utilizing a Vickers microindentation hardness test.
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Borg-Warner Corporation
Doll John
Geppert James A.
Langel Wayne A.
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