Patent
1988-03-14
1989-06-13
Edlow, Martin H.
357 4, 357 67, 357 56, H01L 2348
Patent
active
048397148
ABSTRACT:
A selective contact to a NIPI doping superlattice having a trap free (or low trap density) contact in contact with the layers of the superlattice. In a NIPI superlattice, the trap free region is a doped region that can be produced: by diffusion of dopant ions from a doped metal contact; by overdoping of the edges of the superlattice; or by overgrowth of the edges of the superlattice with a doped material that is trap free.
REFERENCES:
patent: 4257055 (1981-03-01), Hess
patent: 4607272 (1986-08-01), Osburn
patent: 4645707 (1987-02-01), Davies
Boatman Betty
Doehler Gottfried H.
Scott Caroline J.
Trott Gary R.
Edlow Martin H.
Frazzini John A.
Hewlett--Packard Company
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