Active solid-state devices (e.g. – transistors – solid-state diode – Bipolar transistor structure – With enlarged emitter area
Patent
1994-07-08
1995-11-07
Mentel, William
Active solid-state devices (e.g., transistors, solid-state diode
Bipolar transistor structure
With enlarged emitter area
257587, 257666, 257700, H01L 2312, H01L 2350
Patent
active
054650070
ABSTRACT:
A semiconductor device includes a transistor mounted on the top surface of a substrate. A metal sheet is disposed on a metallized electrode on the substrate to which the emitter, for example, of the transistor is electrically connected. The emitter is electrically connected by a thin metal wire to the metal sheet. An MOS capacitor is disposed on the metal sheet, and a plated through-hole beneath the metal sheet connects the metallized electrode directly to a metallized ground electrode disposed on the bottom surface of the substrate.
REFERENCES:
patent: 3916434 (1975-10-01), Garboushian
patent: 3999142 (1976-12-01), Presser et al.
patent: 4168507 (1979-09-01), Yester, Jr.
patent: 4783697 (1988-11-01), Benenti et al.
Ikeda Yasukazu
Matsumoto Hideo
Sakamoto Susumu
Brown Peter Toby
Mentel William
Mitsubishi Denki & Kabushiki Kaisha
LandOfFree
High frequency transistor with reduced parasitic inductance does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High frequency transistor with reduced parasitic inductance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High frequency transistor with reduced parasitic inductance will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-198712