Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1989-08-21
1991-05-21
Pal, Asok
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134184, B08B 700
Patent
active
050172360
ABSTRACT:
A single substrate high frequency sonic processing module uses a substrate chamber dimensionally sized to the substrate for immersing the substrate in processing solution. Sonic wave permeable membranes form two ends of the substrate chamber along a sonic wave path therethrough. A sonic wave generated by a transducer external to the substrate chamber, travels through sonic wave conducting liquid in contact with the first membrane, external to the substrate chamber. The liquid is shaped by a sonic wave guide of continuously diminishing cross sectional area along the sonic wave path therethrough, thus intensifying and concentrating the sonic wave entering the substrate chamber. The sonic wave passes through the second membrane to a sonic absorbing and dissipating ante chamber. A method for sonic processing of substrates is disclosed. The individual sonic processing modules are combined into a single system for simultaneously processing plural substrates. The minimal sized substrate chamber provides effective processing with minimal processing solution, minimizing cost and disposal. The shaped wave guide concentrates and intensifies the sonic wave guide to provide enhanced processing.
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Grant Robert W.
Moxness Sherman U.
FSI International Inc.
Pal Asok
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