High frequency magnetic field coupling arc plasma reactor

Electric heating – Metal heating – By arc

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

31511121, 31511151, 219121P, 219121PR, 219121PN, B23K 900

Patent

active

043862586

ABSTRACT:
A plasma reactor is developed on the fact that a high frequency plasma flame is larger in volume and lower in velocity and therefore a reaction material can stay therein for a relatively long period of time. The plasma reactor has a d.c. arc plasma torch provided in the upper part of the pipe which is an electrically insulative pipe high in heat-resistance and corrosion-resistance or is made up of electrically conductive components which are so designed as to prevent magnetic induction, a reaction material continuously introducing pipe opened in the vicinity of the arc plasma jet from the torch, and a high frequency coil wound around the firstly mentioned pipe coaxially with the torch.

REFERENCES:
patent: 3296410 (1967-01-01), Hedger
patent: 3373306 (1968-03-01), Karlovitz
patent: 3407281 (1968-10-01), Greene et al.
patent: 3586905 (1971-06-01), Bignell
patent: 3620008 (1971-11-01), Newbold
patent: 3862393 (1975-01-01), Dundas et al.
patent: 4024373 (1977-05-01), Bykhousky et al.
patent: 4035604 (1977-07-01), Meleka et al.
patent: 4266113 (1981-05-01), Denton et al.
AIAA Journal, "Stale Control of Flowing Plasma . . . Fields", vol. 5, No. 5, May 1967, pp. 1015-1016.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High frequency magnetic field coupling arc plasma reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High frequency magnetic field coupling arc plasma reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High frequency magnetic field coupling arc plasma reactor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2246926

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.