High-frequency diode

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Avalanche diode

Reexamination Certificate

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Reexamination Certificate

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07737470

ABSTRACT:
A high-frequency diode has a first semiconductor area with a first conductivity type as well as a barrier area adjacent to the first semiconductor area, which has a second conductivity type, which differs from the first conductivity type. Further, the high-frequency diode has a second semiconductor area adjacent to the barrier area, which has the second conductivity type and a dopant concentration which is lower than the dopant concentration of the barrier are or equal to zero. Further, the high-frequency diode has a third semiconductor area adjacent to the second semiconductor area, which has the same conductivity type and a higher dopant concentration than the barrier area. Through such a structure it is possible to provide a high-frequency diode with short switching times and low bias.

REFERENCES:
patent: 2806983 (1957-09-01), Hall
patent: 3019352 (1962-01-01), Wertwijn
patent: 3510735 (1970-05-01), Gene
patent: 3553536 (1971-01-01), Neilson
patent: 5243199 (1993-09-01), Shiomi et al.
patent: 5969402 (1999-10-01), Rynne
patent: 6891250 (2005-05-01), Sakamoto
patent: 6911715 (2005-06-01), Park et al.
patent: 2006/0267045 (2006-11-01), Ogura et al.
patent: 0 090 722 (1985-11-01), None
patent: 0440344 (1991-08-01), None
patent: 2000-164763 (2000-06-01), None
patent: 2002-076009 (2002-03-01), None

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