High flow rate bubbler system and method

Details High flow rate bubbler system and method High flow rate bubbler system and method

2005-04-05

2005-04-05

Bushey, Scott (Department: 1724)

Gas and liquid contact apparatus

With external supply or removal of heat

Temperature or humidity sensor

C261S142000, C261S122100, C096S251000, C096S358000

Reexamination Certificate

active

06874770

ABSTRACT:
A high flow rate bubbler system and method are provided for producing a stable, easily controllable source of chemical vapors to a downstream process. The bubbler system is equipped with a vaporizer unit connected to its gas outlet tube. This vaporizer unit slows the gas velocity to enhance settling of entrained droplets and contacts the exiting gas with a high thermal mass, heated surfaces to promote heat transfer and evaporation of the entrained droplets.

REFERENCES:
patent: 1339609 (1920-05-01), Stinson
patent: 1563125 (1925-11-01), Ward
patent: 4350505 (1982-09-01), Mallory et al.
patent: 4618462 (1986-10-01), Fisher
patent: 4861524 (1989-08-01), Sielaff et al.
patent: 4968336 (1990-11-01), Reimanis et al.
patent: 5029471 (1991-07-01), Goodrich
patent: 5078922 (1992-01-01), Collins et al.
patent: 5354347 (1994-10-01), McCoy et al.
patent: 5855775 (1999-01-01), Kerfoot
patent: 6083407 (2000-07-01), Kerfoot
patent: 6094948 (2000-08-01), Hong et al.
patent: 6179277 (2001-01-01), Huston et al.
patent: 6409839 (2002-06-01), Sun et al.
patent: 20030042630 (2003-03-01), Babcoke et al.

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