High finesse holographic fabry-perot etalon and method of fabric

Details High finesse holographic fabry-perot etalon and method of fabric High finesse holographic fabry-perot etalon and method of fabric

1992-08-24

1994-03-08

Arnold, Bruce Y.

Optical: systems and elements

Holographic system or element

359 3, 359 30, 359900, 356347, G03H 100, G01B 9021

Patent

active

052932729

ABSTRACT:
A high finesse holographic Fabry-Perot etalon and method of making a high finesse holographic Fabry-Perot etalon is disclosed. Particularly, a holographic Fabry-Perot etalon which achieves high finesse despite non-flat interfaces between the etalon media is presented. In a preferred method of fabricating a high finesse Fabry-Perot etalon, single step recording of both holograms simultaneously, with the spacer and substrates in place, is employed which preserves full phase synchronization between the holograms. In spite of imperfections or irregularities of the interface surfaces of the substrates or spacers, the holographic fringes in the holograms remain flat even for slightly different refractive indices between the various media. The position and flatness of the fringes remains similar to perfect Fabry-Perot etalon structure.

REFERENCES:
patent: 4790634 (1988-12-01), Miller et al.
"Multiplexed Holographic Fabry-Perot Etalons", Lin et al., Applied Optics, vol. 31, No. 14, May 10, 1992 (pp. 2478-2484).
C. P. Kuo, T. Aye, D. G. Pelka, J. Jannson, and T. Jannson, "Tunable holographic Fabry-Perot etalon fabricated from poor quality-glass substrates," Optics Letters, vol. 15, No. 7, Apr. 1, 1990, 351-353.

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