Oscillators – Molecular or particle resonant type
Patent
1979-04-10
1981-03-31
Sikes, William L.
Oscillators
Molecular or particle resonant type
H01S 322
Patent
active
042596459
ABSTRACT:
A high energy XeBr laser for producing coherent radiation at 282 nm. The XeBr laser utilizes an electric discharge as the excitation source to minimize formation of molecular ions thereby minimizing absorption of laser radiation by the active medium. Additionally, HBr is used as the halogen donor which undergoes harpooning reactions with Xe.sub.M * to form XeBr*.
REFERENCES:
patent: 3991385 (1976-11-01), Fein et al.
"High Energy Lasing of XeBr in an Electric Discharge" by Sze et al; Appl. Phys. Lett. 32(8), Apr. 1978.
"1/4-J Discharge Pumped KrF Laser" by Sze et al; Rev. Sci. Instrum. 49(6), Jun. 1978.
"Intense Lasing in Discharge Excited Noble-Gas Monochlorides" by Sze et al; Appl. Phys. Lett. 33(5), Sep. 1978.
"KrCl Laser Oscillation at 222 nm" by Murray et al; Appl. Phys. Lett. 29(4), Aug. 1976.
"Observation of Stimulated Emission in KrCl" by Gary Eden et al; Appl. Phys. Lett. 29(6), Sep. 1978.
"XeBr Exciplex Laser" by Searless; Appl. Phys. Lett. 28(10), May 1976.
"Stimulated Emission at 281.8 nm from XeBr" by Searless et al; Appl. PHys. Lett. 27(4), Aug. 1975.
LA-UR-78-2748; "Improved Lasing Performance of XeCl Using Ar and Ne Diluents"; Appl. Phys. Lett. submitted Oct. 1978 by Robert E. Sze.
LA-UR-79-193; "Theoretical Studies of Molecular Electronic Transition Lasers"; Annual Rev. of Phys. Chem. submitted by Hay et al.
Scott Peter B.
Sze Robert C.
Cochran II William W.
Denny James E.
Gaetjens Paul D.
Jr. Leon Scott
Sikes William L.
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