High energy radiation exposed positive resist mask process

Details High energy radiation exposed positive resist mask process High energy radiation exposed positive resist mask process

1974-05-28

1978-03-07

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96 362, 96 48R, 427273, B05D 306

Patent

active

040780988

ABSTRACT:
The development of high energy radiation exposed positive acrylate polymer resist layers by organic liquid developers, such as methyl isobutyl ketone, is improved by adding water to the ketone.

REFERENCES:
patent: 2892712 (1959-06-01), Plambeck
patent: 3535137 (1970-10-01), Haller et al.
patent: 3770433 (1973-11-01), Bartelt et al.
patent: 3779806 (1973-12-01), Gipstein et al.

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