High energy laser mask and method of making same

Details High energy laser mask and method of making same High energy laser mask and method of making same

1989-04-17

1990-05-08

Dees, Jose

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, 430324, 430945, 378 35, 156626, G03F 100

Patent

active

049237721

ABSTRACT:
The present invention is a mask and methods for making masks for use with a laser projection etching system. The unique mask is able to withstand the fluences of the high energy and high power lasers used without degrading. Specifically, the new projection etching masks are fabricated of patterned multiple dielectric layers having alternating high and low indices of refraction on a UV grade synthetic fused silica substrate in order to achieve maximum reflectivity of the laser energy in the opague areas and maximum transmissivity of the laser energy in the transparent areas of the mask.

REFERENCES:
patent: 4440841 (1984-04-01), Tabuchi
patent: 4447905 (1984-05-01), Dixon et al.
patent: 4478677 (1984-10-01), Chen et al.
patent: 4490210 (1984-12-01), Chen et al.
patent: 4490211 (1985-12-01), Chen et al.
patent: 4514896 (1985-05-01), Dixon et al.
patent: 4522862 (1985-06-01), Bayer et al.
IBM Technical Disclosure Bulletin, vol. 13, No. 1, Jun. 1970, p. 158, New York, U.S.; W. M. Moreau et al.: "Dielectric Photomasks".
Research Disclosure, No. 258-25856, Oct. 1985, anonymous, "Damage Resistant Metal Projection Masks for High Intensity UV Radiation".

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