High energy disinfection of waste

Hazardous or toxic waste destruction or containment – Processes for making harmful chemical substances harmless,... – By subjecting to electric or wave energy or particle or...

Reexamination Certificate

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C422S023000, C204S157150, C204S164000

Reexamination Certificate

active

07989673

ABSTRACT:
An apparatus subjects fluid waste to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 1/hr to about 2000 1 hr.

REFERENCES:
patent: 4954320 (1990-09-01), Birmingham et al.
patent: 5387324 (1995-02-01), Ibbott et al.
patent: 5624544 (1997-04-01), Deguchi et al.
patent: 5656171 (1997-08-01), Strachwitz
patent: 5711950 (1998-01-01), Lorenzen
patent: 5824353 (1998-10-01), Tsunoda et al.
patent: 5866010 (1999-02-01), Bogatin et al.
patent: 5876663 (1999-03-01), Laroussi
patent: 5965009 (1999-10-01), Shimamune et al.
patent: 5997590 (1999-12-01), Johnson et al.
patent: 6033678 (2000-03-01), Lorenzo
patent: 6165339 (2000-12-01), Ibbott
patent: 6284054 (2001-09-01), Galvin
patent: 6379539 (2002-04-01), Ubelhor
patent: 11-253522 (1999-09-01), None

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