High emittance electron source having high illumination uniformi

Details High emittance electron source having high illumination uniformi High emittance electron source having high illumination uniformi

1998-04-08

2000-07-18

Day, Michael H.

Electric lamp and discharge devices

Discharge devices having a thermionic or emissive cathode

313237, 313337, 315107, H01J 102

Patent

active

060911875

ABSTRACT:
Direct and indirect electron bombardment provide a sufficiently high degree of temperature uniformity across the emitting surface of a large-area electron source for an electron beam projection system such that a broad beam having illumination uniformity within 1% can be achieved. A diode gun is used to obtain extraction field uniformity and maintain uniformity of illumination. Power requirements and power dissipation in beam periphery truncating apertures is reduced by roughening the surface of a monocrystalline cathode or depositing materials having a higher work function thereon.

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A.H.W. Beck, High-Current-Density Termionic Emitters: A Survey; The Institution of Electrical Engineers; Paper No. 2750R; Nov., 1958, pp. 372-390.

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