High electron mobility transistor

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257194, 257 29, H01L 2906, H01L 31072, H01L 31109

Patent

active

053212789

ABSTRACT:
A field-effect transistor (FET) in which an InGaAs layer formed on a GaAs substrate is formed in such a manner that the In composition ratio on the gate electrode side on the substrate surface is made small and the In composition ratio on the GaAs substrate side is made large. Thereby, the FET does not cause a decline in the mutual conductance in the FET and a decline in the noise figure (NF) even if negative voltage is applied to a gate electrode.

REFERENCES:
patent: 4827320 (1989-05-01), Morkoc et al.
patent: 5116774 (1992-05-01), Huang et al.
J. W. Matthews and A. E. Blakeslee, "Defects in Epitaxial Multilayers, I. Misfit Dislocations", Journal of Crystal Growth, vol. 27, 1974, pp. 118-125.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High electron mobility transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High electron mobility transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High electron mobility transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1251238

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.