Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1999-07-07
2000-11-21
Bueker, Richard
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427569, 118723E, C23C 1600
Patent
active
061499854
ABSTRACT:
A method and apparatus are taught for treating polymer webs for obtaining the proper surface characteristics to promote adhesion of photosensitive coating materials and/or layers typically coated thereon. The web is passed through a high-voltage sheath region or dark space of the plasma generated by a powered electrode residing in a discharge zone. The frequency of the driving voltage must be above a lower bound dictated by the properties of the polymer support and the plasma, and it must be below an upper bound beyond which the sheath voltages drop significantly and it is observed that the benefits of this approach diminish. The dark space is generated by a treatment electrode in a treatment zone. There is a counter electrode having a surface area in said treatment zone which is at least as great as the surface area of the treatment electrode. A power supply is included for driving the treatment electrode with an oscillating high voltage at a frequency less than about 2 MHz and greater than 1/t.sub.c where t.sub.c is the charging time of a web surface exposed to a rms ion current in the plasma.
REFERENCES:
patent: 3288638 (1966-11-01), Van Paassen et al.
patent: 3309299 (1967-03-01), Mantell
patent: 4429032 (1984-01-01), Matthe et al.
patent: 4451497 (1984-05-01), Dolezalek et al.
patent: 5224441 (1993-07-01), Felts et al.
patent: 5324414 (1994-06-01), Spahn et al.
patent: 5493117 (1996-02-01), Tamaki et al.
patent: 5538841 (1996-07-01), Grace et al.
patent: 5563029 (1996-10-01), Grace et al.
patent: 5576164 (1996-11-01), Grace et al.
patent: 5618659 (1997-04-01), Grace et al.
Surfaces & Coating Technology 93 1997 pp. 261-264, Polymer surface modification by plasma source ion implantation, by Seunghee Han, Yeonhee Lee, Haidong Kim, Gon-ho Kim, Junghey Lee, Jung-Hyeon Yoon, Gunwoo Kim.
Rarefied Gas Dynamics: Experimental Techniques and Physical Systems, vol. 158 Progress in Astronautics and Aeronautics "Materials Processing in Dual-Mode Microwave/Radiofrequency Plasmas" by J.E. KLemberg-Sapieha et al.
Glow Discharge Processes, Brian Chapman, John Wiley & Sons, 1980 pp. 52-71, 80-81, 112-113, 156-169.
Dual-Frequency N2 and NH3 Plasma Modification of Polyethylane and Polyimide by JE Klemberg-Sapieha et al, J Vac Sci Technol A 9 (6) Nov./Dec. 1991 pp 2975-2981.
Gerenser Louis J.
Grace Jeremy M.
Bocchetti Mark G.
Bueker Richard
Eastman Kodak Company
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