High-efficiency, multilevel, diffractive optical elements

Details High-efficiency, multilevel, diffractive optical elements High-efficiency, multilevel, diffractive optical elements

1991-12-02

1993-06-08

Arnold, Bruce Y.

Optical: systems and elements

Diffraction

From zone plate

359569, 359742, 430321, 430323, 430324, G02B 2744, G02B 308, G03C 500

Patent

active

052184714

ABSTRACT:
The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.

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