High dielectric constant spacer for imagers

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S066000, C438S075000, C257S291000, C257S222000, C257S225000, C257SE27133

Reexamination Certificate

active

07622321

ABSTRACT:
An imager having gates with spacers formed of a high dielectric material. The high dielectric spacer provides larger fringing fields for charge transfer and improves image lag and charge transfer efficiency.

REFERENCES:
patent: 3909925 (1975-10-01), Forbes et al.
patent: 4700459 (1987-10-01), Peek
patent: 4742027 (1988-05-01), Blanchard et al.
patent: 5002896 (1991-03-01), Naruke
patent: 5149664 (1992-09-01), Shin et al.
patent: 5494838 (1996-02-01), Chang et al.
patent: 5512499 (1996-04-01), Cambou et al.
patent: 5698883 (1997-12-01), Rhodes
patent: 5846863 (1998-12-01), Lee et al.
patent: 5904517 (1999-05-01), Gardner et al.
patent: 6023081 (2000-02-01), Drowley et al.
patent: 6121138 (2000-09-01), Wieczorek et al.
patent: 6140630 (2000-10-01), Rhodes
patent: 6159800 (2000-12-01), Liu et al.
patent: 6204524 (2001-03-01), Rhodes
patent: 6310366 (2001-10-01), Rhodes et al.
patent: 6326652 (2001-12-01), Rhodes
patent: 6333205 (2001-12-01), Rhodes
patent: 6376868 (2002-04-01), Rhodes
patent: 6448592 (2002-09-01), Peek et al.
patent: 6504196 (2003-01-01), Rhodes
patent: 6524913 (2003-02-01), Lin et al.
patent: 6531725 (2003-03-01), Lee et al.
patent: 6548352 (2003-04-01), Rhodes
patent: 6849516 (2005-02-01), Feudel et al.
patent: 6869817 (2005-03-01), Hwang
patent: 2001/0020723 (2001-09-01), Gardner et al.
patent: 2001/0032988 (2001-10-01), Yoshida et al.
patent: 2001/0039068 (2001-11-01), Lee et al.
patent: 2003/0030083 (2003-02-01), Lee et al.
patent: 2004/0089883 (2004-05-01), Kim
patent: 2004/0129990 (2004-07-01), Lee
patent: 2004/0169127 (2004-09-01), Ohkawa
patent: 2005/0006676 (2005-01-01), Watanabe
patent: 2005/0040393 (2005-02-01), Hong
patent: 2005/0121733 (2005-06-01), Chen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High dielectric constant spacer for imagers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High dielectric constant spacer for imagers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High dielectric constant spacer for imagers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4120113

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.