High density silicon oxynitride

Details High density silicon oxynitride High density silicon oxynitride

1980-05-12

1982-05-25

Bell, Mark

Compositions: ceramic

Ceramic compositions

Refractory

264 65, C04B 3558

Patent

active

043317715

ABSTRACT:
A reaction bonded silicon oxynitride product having a density of 85 to 95% of theoretical density, a degree of density heretofore not attainable by sintering or reaction bonding. Such high densities are attained by nitriding, in an oxygen free atmosphere ultra fine silicon and ultra fine silica in the presence of certain reaction aids. The particle size of the silicon powder must be at least as fine as about 3 microns and the silica as fine as about 0.3 microns.

REFERENCES:
patent: 3356513 (1967-12-01), Washburn
patent: 3639101 (1972-02-01), Washburn
patent: 3679444 (1972-07-01), Washburn
patent: 3892840 (1975-07-01), Abildtrup
patent: 4069058 (1978-01-01), Washburn
patent: 4143107 (1979-03-01), Ishii et al.

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