High density multi-level metallization and interconnection struc

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified configuration

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257763, 257768, 257760, 257900, H01L 2348, H01L 2944, H01L 2952, H01L 2962

Patent

active

056190727

ABSTRACT:
Increased densification in a semiconductor chip is provided by a negative enclosure of a conductive via utilizing an etch stop insulating material.

REFERENCES:
patent: 3841031 (1974-10-01), Walsh
patent: 3911562 (1975-10-01), Youmans
patent: 4193226 (1980-03-01), Gill, Jr. et al.
patent: 4394678 (1983-07-01), Winchell, II et al.
patent: 4811522 (1989-03-01), Gill, Jr.
patent: 4859630 (1989-08-01), Josquin
patent: 4916521 (1990-04-01), Yoshikawa et al.
patent: 4944836 (1990-07-01), Beyer et al.
patent: 5014109 (1991-05-01), Higuchi
patent: 5233223 (1993-08-01), Murayama
patent: 5236870 (1993-08-01), Sakata et al.
patent: 5243220 (1993-09-01), Shibata et al.
patent: 5245794 (1993-09-01), Salugsugan
patent: 5334862 (1994-08-01), Manning et al.
patent: 5462893 (1995-10-01), Matsuoka et al.
I.B.M. Technical Disclosure Bulletin, vol. 32 No. 6B Nov. 1989 "Low Sheet Resistance Gate Electrode with Conventional Bord-rless Contarts" pp. 122 +123.
"Silicon Processing for the VLSI Era," Wolf, Lattice Press, 1990, vol. 2, pp. 124-128, 192-199, 212-217, 229-233, 268-273.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High density multi-level metallization and interconnection struc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High density multi-level metallization and interconnection struc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High density multi-level metallization and interconnection struc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2399339

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.