Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Patent
1999-02-12
2000-11-07
Niebling, John F.
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
438197, 438229, 438257, H10L 2100
Patent
active
061435821
ABSTRACT:
The invention relates to device processing, packaging and interconnects that will yield integrated electronic circuitry of higher density and complexity than can be obtained by using conventional multi-chip modules. Processes include the formation of complex multi-function circuitry on common module substrates using circuit tiles of silicon thin-films which are transferred, interconnected and packaged. Circuit modules using integrated transfer/interconnect processes compatible with extremely high density and complexity provide large-area active-matrix displays with on-board drivers and logic in a complete glass-based modules. Other applications are contemplated, such as, displays, microprocessor and memory devices, and communication circuits with optical input and output.
REFERENCES:
patent: 4575854 (1986-03-01), Martin
patent: 4612083 (1986-09-01), Yasumoto
patent: 4727047 (1988-02-01), Bozler et al.
patent: 4769680 (1988-09-01), Resor, III et al.
patent: 4774205 (1988-09-01), Choi et al.
patent: 4808983 (1989-02-01), Benjamin et al.
patent: 4837182 (1989-06-01), Bozler et al.
patent: 4838654 (1989-06-01), Hamaguchi et al.
patent: 4846931 (1989-07-01), Gmitter et al.
patent: 4855255 (1989-08-01), Goodhue
patent: 4863877 (1989-09-01), Fan et al.
patent: 4870475 (1989-09-01), Endo et al.
patent: 4883561 (1989-11-01), Gmitter et al.
patent: 4935792 (1990-06-01), Tanaka et al.
patent: 4961629 (1990-10-01), Kato
patent: 4965565 (1990-10-01), Noguchi
patent: 4979002 (1990-12-01), Pankove
patent: 5045895 (1991-09-01), Yoshida et al.
patent: 5073806 (1991-12-01), Idei
patent: 5084905 (1992-01-01), Sasaki et al.
patent: 5087585 (1992-02-01), Hayashi
patent: 5117298 (1992-05-01), Hirai
patent: 5166816 (1992-11-01), Kaneko et al.
patent: 5184235 (1993-02-01), Sukegawa
patent: 5187379 (1993-02-01), Noda
patent: 5191453 (1993-03-01), Okumura
patent: 5206749 (1993-04-01), Zavracky et al.
patent: 5233211 (1993-08-01), Hayashi et al.
patent: 5245452 (1993-09-01), Nakamura et al.
patent: 5258325 (1993-11-01), Spitzer et al.
patent: 5300788 (1994-04-01), Fan et al.
patent: 5317433 (1994-05-01), Miyawaki et al.
patent: 5347154 (1994-09-01), Takahashi et al.
patent: 5362671 (1994-11-01), Zavracky et al.
patent: 5377031 (1994-12-01), Vu et al.
patent: 5499124 (1996-03-01), Vu et al.
patent: 5702963 (1997-12-01), Vu et al.
patent: 5757445 (1998-05-01), Vu et al.
Milnes, A.G., "Semiconductor Heterojunction Topics: Introduction and Overview," Solid-State Electronics, 29(2):99-121, (1986).
Akiyama, M. et al., "Growth of GaAs on Si and Its Application to FETs and LEDs," Nat. Res. Soc. Proc., 67:53-64, (1986).
Turner, G. et al., "High-Speed Photoconductive Detectors Fabricated in Heteroepitaxial GaAs Layers," Mat. Res. Soc. Symp. Proc., 67:181-188 (1986).
McDaniel, D.L. et al., "Vertical Cavity Surface-Emitting Semiconductor Laser with CW Injection Laser Pumping," IEEE Photonics Techology Letters,2:156-158 (1990).
Weber, J.P. et al., "Effects of Layer Thickness Variations on Vertical Cavity Surface-Emitting DBR Semiconductor Lasers," IEEE Photonics Technology Letters, 2:162-164 (1990).
"3-D Chip-On-Chip Stacking," Semiconductor International, p. 12 (Dec. 1991).
McClelland et al., "A Technique for Producing Epitaxial Films on Reusable Substrates", Appl. Phys. Lett., 37: 560-562 (1980).
Yablonovitch et al., "Extreme Selectivity in the Lift-Off of Epitaxial GaAs Films," Appl. Phys. Lett, 51: 2222-2224 (1987).
Fan et al., "Lateral Epitaxy by Seeded Solidification for Growth of Crystal Si Films on Insulators," Appl. Phys. Lett., 38: 365-367 (1981).
Allen et al., "Characterization of Isolated Silicon Epitaxy Material," SPIE vol. 945--Advanced Processing of Semiconductor Devices II, 945: 126-130 (1988).
Conference Record of the 1991 International Display Research Conference, (Oct. 15-17, 1991) IEEE.
Y. Hayashi et al., "A New Three Dimensional IC Fabrication Technology, Stacking Thin Film Dual-CMOS Layers," IEEE IEDM, pp. 657-660 (1991).
U. Konig, "Dreidimensionale Integration," Electroniker, (10):79-82 (Oct. 1989). (English translation only).
E. Hofmeister, "Mikroelektronik 2000," Siemans Components, 27(2):54-58 (Mar./Apr. 1989). (English Translation Only).
Cheong Ngwe
Dingle Brenda
Vu Duy-Phach
Kopin Corporation
Niebling John F.
Simkovic Viktor
LandOfFree
High density electronic circuit modules does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High density electronic circuit modules, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High density electronic circuit modules will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1639695