High curvature antenna forming process

Metal working – Method of mechanical manufacture – Electrical device making

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29846, H01P 1100

Patent

active

054370914

ABSTRACT:
A high curvature antenna is formed by using a multiple layer of laminate positioned between all microstrip elements and the conductive ground plane. By using multiple layers of laminate material, attached to one another with a thin bonding film, the antenna is easily configured in a high curvature manner. This structure and method of fabrication allows for the manufacture of a high curvature antenna having no wrinkles, kinks or discontinuities of any type in the ground plane, thus reducing defects when the antenna is produced.

REFERENCES:
patent: 4010470 (1977-03-01), Jones, Jr.
patent: 4051480 (1977-09-01), Reggia et al.
patent: 4078237 (1978-03-01), Kaloi
patent: 4110751 (1978-08-01), Reggia et al.
patent: 4738746 (1988-04-01), Clariou
patent: 4816836 (1989-03-01), Lalezari
patent: 4823145 (1989-04-01), Mayes et al.
patent: 4853704 (1989-08-01), Diaz et al.
patent: 4931808 (1990-06-01), Lalezari et al.
patent: 4937935 (1990-07-01), Clariou
patent: 4944087 (1990-07-01), Landi
patent: 4980694 (1990-12-01), Hines
patent: 5045862 (1991-09-01), Alden et al.

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