High current ion source

Details High current ion source High current ion source

1989-03-08

1990-08-28

Laroche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

31511141, 31511191, 250423R, H01J 724, H05B 3126

Patent

active

049528432

ABSTRACT:
An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.

REFERENCES:
patent: 4481062 (1984-11-01), Kaufman et al.
patent: 4611721 (1986-09-01), Miyamura et al.
patent: 4714860 (1987-12-01), Brown et al.
patent: 4782235 (1988-11-01), Lejeune et al.
"Magnetic Multipole Containment of Large Uniform Collision Less Quiescent Plasmas"-Rudolf Limpaecher et al, Rev. Sci. Instrum., vol. 44, No. 6, Jun. 1973, pp. 726-731.
"A Large Volume Quiescent Plasma in a Uniform Magnetic Field"--Earl R. Ault et al, Rev. Sci. Instrum., vol. 44, No. 12, 12/1973, pp. 1697-1699.

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