High contrast lithographic masks

Details High contrast lithographic masks High contrast lithographic masks

2011-05-17

2011-05-17

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07944545

ABSTRACT:
A structure and a method for an equi-brightness optimization. The method may include projecting a plurality of bright patterns having a plurality of bright points and a plurality of dark patterns having a plurality of dark points on a substrate, generating a plurality of joint eigenvectors of the plurality of bright points and a plurality of dark points, selecting a predetermined number of joint eigenvectors to project the plurality of bright patterns, generating a plurality of natural sampling points from the plurality of bright points, wherein the plurality of natural sampling points has a substantially equal intensity, and obtaining a representation of an aperture from the plurality of natural sampling points, wherein an image of the representation of the aperture has a substantially uniform intensity.

REFERENCES:
patent: 5680588 (1997-10-01), Gortych et al.
patent: 5991006 (1999-11-01), Tsudaka
patent: 6444373 (2002-09-01), Subramanian et al.
patent: 6869738 (2005-03-01), Oshima et al.
patent: 6918104 (2005-07-01), Pierrat et al.
patent: 7057709 (2006-06-01), Rosenbluth
patent: 7079223 (2006-07-01), Rosenbluth et al.
patent: 7802226 (2010-09-01), Park et al.
“Global Optimization of Masks, Including Film Stack Design to Restore TM Contrast in High NA TCC's”, Alan E. Rosenbluth, et al, Proc. Of SPIE vol. 6520, pp. 1-13, Jul. 2007.
“Point Estimation of Simultaneous Methods for Solving Polynomial Equations: A Survey 11”, Miodrag S. Petkovic, et al, Journal of Computational and Applied Mathematics, pp. 32-52, Jul. 2006.
“Finding Zeros of Maps: Homotopy Methods That Are Constructive With Probability One”, Shui-Nee Chow, et al, pp. 887-899, Aug. 1997.
“A Transformation to Avoid Solutions at Infinity for Polynomial Systems”, Alexander P. Morgan, pp. 77-86, Jan. 1986.
“A Homotopy For Solving Polynomial Systems” Alexander P. Morgan, pp. 87-92, Jan. 1986.
“Optimum Mask and Source Patterns to Print a Given Shade”, Alan E. Rosenbluth, et al, 2002 Society of Photo-Optical Instrumentation Engineers, pp. 13-30, Apr. 2002.

Affiliated with

Also associated with

Rating

High contrast lithographic masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High contrast lithographic masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High contrast lithographic masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2680007