High contrast high thermal stability positive photoresists with

Details High contrast high thermal stability positive photoresists with High contrast high thermal stability positive photoresists with

1988-08-02

1990-04-24

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430166, 430193, 430270, G03C 160, G03C 154

Patent

active

049200283

ABSTRACT:
Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and an aromatic aldehyde. When the aromatic aldehyde is a monohydroxy aromatic aldehyde, the novolak resin is especially useful in positive photoresist formulations.

REFERENCES:
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4477553 (1984-10-01), Yamamoto et al.
patent: 4536465 (1985-08-01), Uchara et al.
patent: 4642282 (1987-02-01), Stahlhofen

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