High contrast, high resolution deep ultraviolet lithographic res

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

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430141, 430170, 430189, 430193, 430270, 430302, 430326, 534550, 534558, 534560, 534561, G03C 154

Patent

active

046019693

ABSTRACT:
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.

REFERENCES:
patent: 3567453 (1971-03-01), Borden
patent: 3668197 (1972-06-01), Firestone
patent: 4207107 (1980-06-01), Ross
patent: 4339522 (1982-07-01), Balanson et al.
patent: 4458005 (1984-07-01), Mohr et al.
patent: 4522911 (1985-06-01), Clecak et al.
Regtiz et al., Chem. Ber., 1969, vol. 102, pp. 2216-2229.
Wolter et al., Chem. Ber., 1978, vol. 111, pp. 3068-3085.

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